UHV Chamber for Material Growth Process System

Anderson Dahlen built an ultra-high vacuum chamber used for growing thin films, typically of refractory materials, using a high temp deposition process. Critical tolerances are required for alignment of the ports, relative to one another and the targeted area for film growth. The chamber is double-walled for effective water cooling since the process operates at very high temperatures. These and other critical features are essential for maintaining the integrity of the system during such strenuous processes.

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